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Showing posts with label Atomic Layer Deposition (ALD) technology. Show all posts
Showing posts with label Atomic Layer Deposition (ALD) technology. Show all posts

Monday, February 14, 2022

University of Helsinki, Finland - University of Helsinki and ASM International N.V. expand collaboration on Atomic Layer Deposition with ALD Center of Excellence

Title: 
University of Helsinki and ASM International N.V. expand collaboration on Atomic Layer Deposition with ALD Center of Excellence  
 
Published: 
University of Helsinki, 11 February 2022 
 
From the article: 
Department of Chemistry at the University of Helsinki and ASM International N.V. (“ASM”) have signed an agreement for forming and funding of the ALD Center of Excellence (ALD CoE). Dutch-based ASM is a leading supplier of semiconductor manufacturing equipment.